Performances exhibited by large area ITO layers produced by rf magnetron sputtering

Citation
I. Baia et al., Performances exhibited by large area ITO layers produced by rf magnetron sputtering, THIN SOL FI, 337(1-2), 1999, pp. 171-175
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
337
Issue
1-2
Year of publication
1999
Pages
171 - 175
Database
ISI
SICI code
0040-6090(19990111)337:1-2<171:PEBLAI>2.0.ZU;2-#
Abstract
This work refers to the main electro-optical characteristics exhibited by l arge area indium tin oxide films (300 x 400 mm) produced by r.f. magnetron sputtering under different oxygen concentrations and deposition pressures. Besides that, the ageing effect on the electro-optical characteristics of t he films produced was also analyzed. The results achieved show that the fil m transparency and conductivity were highly improved (more than four orders of magnitude) by first annealing them in air at 470 degrees C, followed by a reannealed stage under vacuum, in a hydrogen atmosphere, at 350 degrees C. The ageing tests show that film degradation occurs when the films are pr oduced at oxygen concentrations above 10% and/or at deposition pressures ab ove 1.2 x 10(-2) mbar. (C) 1999 Elsevier Science S.A. All rights reserved.