Ultraviolet-light-enhanced luminescence in SiC thin films grown on Si by hot filament chemical vapor deposition and ultraviolet-light-induced luminescence in anodized SiC

Citation
Jn. Wang et al., Ultraviolet-light-enhanced luminescence in SiC thin films grown on Si by hot filament chemical vapor deposition and ultraviolet-light-induced luminescence in anodized SiC, APPL PHYS L, 74(7), 1999, pp. 923-925
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
7
Year of publication
1999
Pages
923 - 925
Database
ISI
SICI code
0003-6951(19990215)74:7<923:ULISTF>2.0.ZU;2-F
Abstract
Intense wide-band photoluminescence (PL) was observed at room temperature f rom both SiC thin films grown on silicon substrates by hot-filament chemica l vapor deposition and anodized SiC thin films formed by electrochemical an odization in HF-ethanol solution. It was found that prolonged irradiation w ith ultraviolet light from a He-Cd laser (325 nm, 10 mW) generally enhanced the PL intensity of as-grown SiC but induced a new PL band in anodized SiC at room temperature. The light-induced PL emission in anodized SiC was cen tered at the energy between 2.1 and 2.2 eV in comparison with the initial p eak position of about 1.9 eV. These effects were also temperature dependent . (C) 1999 American Institute of Physics. [S0003-6951(99)04106-6].