Ultraviolet-light-enhanced luminescence in SiC thin films grown on Si by hot filament chemical vapor deposition and ultraviolet-light-induced luminescence in anodized SiC
Jn. Wang et al., Ultraviolet-light-enhanced luminescence in SiC thin films grown on Si by hot filament chemical vapor deposition and ultraviolet-light-induced luminescence in anodized SiC, APPL PHYS L, 74(7), 1999, pp. 923-925
Intense wide-band photoluminescence (PL) was observed at room temperature f
rom both SiC thin films grown on silicon substrates by hot-filament chemica
l vapor deposition and anodized SiC thin films formed by electrochemical an
odization in HF-ethanol solution. It was found that prolonged irradiation w
ith ultraviolet light from a He-Cd laser (325 nm, 10 mW) generally enhanced
the PL intensity of as-grown SiC but induced a new PL band in anodized SiC
at room temperature. The light-induced PL emission in anodized SiC was cen
tered at the energy between 2.1 and 2.2 eV in comparison with the initial p
eak position of about 1.9 eV. These effects were also temperature dependent
. (C) 1999 American Institute of Physics. [S0003-6951(99)04106-6].