M. Niu et al., An improved open-ended waveguide measurement technique on parameters epsilon(r) and mu(r) of high-loss materials, IEEE INSTR, 47(2), 1998, pp. 476-481
Citations number
14
Categorie Soggetti
Instrumentation & Measurement
Journal title
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT
An improved technique of using rectangular waveguide aperture for simultane
ous measurement of the electromagnetic parameters epsilon(r), mu(r) of mate
rials is developed in this paper, Both multilayer and single-layer medium s
heet samples can be tested, Samples are sandwiched between a flange of an o
pen-ended waveguide and a shorting plate, The parameters are obtain by usin
g an optimization technique by fitting the theoretical values of the reflec
tion coefficients Gamma(epsilon(r), mu(r)) to the measured values with epsi
lon(r), mu(r) as the argument. The related details, such as test theories,
waveguide design, sample preparation, and error analysis are also discussed
in this paper. The experimental results are validated by the measurements
performed using the reflection-transmission method using an automatic netwo
rk analyzer and the published data from manufactures. By virtue of its open
-ended waveguide configuration, this technique is well suited for sheet or
coating materials, and it might be applied for industrial on-the-worksite t
esting or biomedical analysis.