Automatic generation of thin film process flows - Part I: Basic algorithms

Citation
Mh. Zaman et al., Automatic generation of thin film process flows - Part I: Basic algorithms, IEEE SEMIC, 12(1), 1999, pp. 116-128
Citations number
21
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
ISSN journal
08946507 → ACNP
Volume
12
Issue
1
Year of publication
1999
Pages
116 - 128
Database
ISI
SICI code
0894-6507(199902)12:1<116:AGOTFP>2.0.ZU;2-F
Abstract
This paper is the first in a series of two papers describing the algorithms used in the development of MISTIC (Michigan synthesis tools for integrated circuits). MISTIC is a planar device process compiler that generates proce ss hows for thin film devices from schematics of their structure, This soft ware uses a laboratory specific database of process recipes to produce proc ess hows for a specific set of laboratory resources (furnaces, etchers, lit hography equipment, etc.) and generates process statistics that help to cho ose the most suitable process how in a comparative manner. The process comp iler is augmented by several auxiliary modules: a device builder, process v iewer, and database editor thus forming a self-contained process design env ironment. This paper concentrates on the algorithms used to construct proce ss hows from schematic device representations. The compiler algorithms firs t extract a directed graph representation of the device organization stored in the form of a restricted square boolean matrix. This matrix is used to generate linear ordered lists of device layers which serve as footprints fo r the construction of profess flows. Process hows are then constructed from these lists through a series of conversions, expansions, and insertions of process steps. The theoretical foundations for the algorithms can be found in [1].