Automatic generation of thin film process flows - Part II: Recipe generation, flow evaluation, and system framework

Citation
Mh. Zaman et al., Automatic generation of thin film process flows - Part II: Recipe generation, flow evaluation, and system framework, IEEE SEMIC, 12(1), 1999, pp. 129-138
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
ISSN journal
08946507 → ACNP
Volume
12
Issue
1
Year of publication
1999
Pages
129 - 138
Database
ISI
SICI code
0894-6507(199902)12:1<129:AGOTFP>2.0.ZU;2-9
Abstract
This paper is the second in a series of two papers describing the methodolo gy and algorithms used in the development of MISTIC (Michigan synthesis too ls for integrated circuits). Part I discussed the basic topological algorit hms used to produce generic sequences of processing steps required for the fabrication of a given device structure. Part II discusses the expansion of these sequences into complete process hows, This procedure involves the se lection of specific recipes from a set of available processing resources an d the calculation of recipe parameters, These processing resources are stor ed in a database central to the MISTIC system framework. Since many process hows are generated for a given device, the paper also discusses the calcul ation of suitable figures of merit. The capabilities of the MISTIC system a re demonstrated with a BiCMOS example. The MISTIC system framework which co ntains the basic compiler and several supporting modules: a device builder, process viewer, and database editor is also presented.