F. Matsumoto et al., Studies on the adsorption behavior of 2,5-dimercapto-1,3,4-thiadiazole and2-mercapto-5-methyl-1,3,4-thiadiazole at gold and copper electrode surfaces, LANGMUIR, 15(3), 1999, pp. 857-865
The adsorption behavior of 2,5-dimercapto-1,3,4-thiadiazole (DMcT) and 2-me
rcapto-5-methyl-1,3,4-thiadiazole (McMT) on Au and Cu electrode surfaces wa
s studied using a 5 MHz quartz crystal microbalance (QCM), cyclic voltammet
ry, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and phase m
easurement interferometric microscopy (PMIM). Different behaviors were obse
rved for the adsorption of DMcT and McMT on Au and Cu electrodes. Exposing
the Au electrode to a McMT solution resulted in the formation of a stable,
self-assembled monolayer on the electrode surface. A sharp peak resulting f
rom the reductive desorption (RD) of McMT was observed for McMT chemisorbed
on the Au electrode. It was also found that dimer-DMcT (di-DMcT) should be
used in order to construct a stable DMcT layer on an Au electrode. Detaile
d comparisons of charge consumption and mass change during reductive desorp
tion suggest that chemisorbed di-DMcT is monomeric and desorbs completely f
rom the Au electrode in the RD process. However, on a Cu elect-rode surface
, a stable McMT layer could not be constructed. It was also confirmed from
PMIM experiments and Raman spectroscopy that DMcT etched copper electrodes,
along with concurrent formation of a dimer form of DMcT (di-DMcT). The app
arent reason for the different adsorption behaviors between DMcT and McMT i
s that DMcT is a stronger proton donor and oxidant.