New CMOS fully differential difference transconductors and application to fully differential filters suitable for VLSI

Citation
Sa. Mahmoud et Am. Soliman, New CMOS fully differential difference transconductors and application to fully differential filters suitable for VLSI, MICROELEC J, 30(2), 1999, pp. 169-192
Citations number
20
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS JOURNAL
ISSN journal
00262692 → ACNP
Volume
30
Issue
2
Year of publication
1999
Pages
169 - 192
Database
ISI
SICI code
0026-2692(199902)30:2<169:NCFDDT>2.0.ZU;2-F
Abstract
New CMOS voltage controlled fully differential difference transconductors ( FDDT) are presented. The basic structure of the proposed transconductors is based on the current Linearization of basic MOS cells in different configu rations consisting from two or four NMOS matched transistors operating in t he saturation region. The proposed transconductors are used to design fully differential second order lowpass, bandpass and highpass filters suitable for VLSI. PSpice simulation results for the proposed fully differential dif ference transconductors and their filter applications indicating the linear ity range and verifying the analytical results are also given. (C) 1999 Els evier Science Ltd. All rights reserved.