Extraction of the BSIM3 1/f noise parameters in CMOS transistors

Citation
Jc. Vildeuil et al., Extraction of the BSIM3 1/f noise parameters in CMOS transistors, MICROELEC J, 30(2), 1999, pp. 199-205
Citations number
14
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS JOURNAL
ISSN journal
00262692 → ACNP
Volume
30
Issue
2
Year of publication
1999
Pages
199 - 205
Database
ISI
SICI code
0026-2692(199902)30:2<199:EOTB1N>2.0.ZU;2-1
Abstract
Flicker noise is investigated in a set of transistors issued from a 0.8 mu m CMOS technology in order to extract parameters for simulation using BSIM3 (Berkeley Short-channel IGFET Model). The noise model used in BSIM3 is dis cussed, an appropriate extraction procedure is proposed. Intrinsic channel noise variations versus device biases agree with Hooge's theory (carrier mo bility fluctuations) for p-MOSTs and with Me Whorter's theory (carrier numb er fluctuations) for n-MOSTs. It is shown that for the studied technology t wo noise parameters (NOIA and NOIB) can model the intrinsic channel noise. For p-MOSTs, NOIA and NOIB are constants and for n-MOSTs NOIA is also a con stant while NOIB is inversely proportional to the effective gate voltage. G ood agreement between simulation and experimental results is obtained. (C) 1999 Elsevier Science Ltd. All rights reserved.