Citation
D. Dobrev et al., Electrochemical preparation of metal microstructures on large areas of etched ion track membranes, NUCL INST B, 149(1-2), 1999, pp. 207-212
Citations number
21
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X
→ ACNP
Volume
149
Issue
1-2
Year of publication
1999
Pages
207 - 212
Database
ISI
SICI code
0168-583X(199901)149:1-2<207:EPOMMO>2.0.ZU;2-0
Abstract
A microgalvanic method for metal filling of etched ion tracks in organic fo
ils on large areas is described. The method and the used galvanic cell perm
it the deposition of stable standing individual metal whiskers with high as
pect ratio and a density of 10(5)-10(8) per cm(2) on an area of 12.5 cm(2).
The method was verified with copper and it is suitable also for various ot
her metals. It can be applied for the replication of etched ion tracks and
for the fabrication of microstructures containing large numbers of individu
al metal whiskers. (C) 1999 Elsevier Science B.V. All rights reserved.