Elemental dislocation mechanisms involved in the relaxation of heteroepitaxial semiconducting systems

Citation
B. Pichaud et al., Elemental dislocation mechanisms involved in the relaxation of heteroepitaxial semiconducting systems, PHYS ST S-A, 171(1), 1999, pp. 251-265
Citations number
40
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
171
Issue
1
Year of publication
1999
Pages
251 - 265
Database
ISI
SICI code
0031-8965(19990116)171:1<251:EDMIIT>2.0.ZU;2-0
Abstract
Different elemental dislocation mechanisms are considered and we try to hig hlight their special behaviour in relation to the layer geometry. The nucle ation of misfit dislocations is the first step, we show here that the mecha nism proposed by Matthews et al. can actually be observed in low misfit sys tems. The development of dislocations is then studied and we underline some particular problems which could influence the dislocation length: the role of the cooling step and of the uncertainty on G(dk), the formation energy of kink pairs. The interactions between emerging segments or an emerging se gment and a misfit dislocation are reviewed. Finally the role of dislocatio n cross slipping is discussed and it is shown that in epitaxial stressed fi lms this mechanism is favoured by the shrinkage of the fault ribbon.