G. Salviati et al., Cathodoluminescence and transmission electron microscopy study of the influence of crystal defects on optical transitions in GaN, PHYS ST S-A, 171(1), 1999, pp. 325-339
Defect related states and excitonic transitions in epitaxial GaN have been
studied by combining cathodoluminescence and transmission electron microsco
py. A series of deep revels with energies at about 2.4, 2.6 and 2.8 eV has
been found by low temperature cathodoluminescence on freestanding 150 mu m
thick epitaxial GaN. These deep levels are characterised by a high recombin
ation efficiency. They are radiative from 5 to 70 K and undergo a nonradiat
ive transition at 70 K. These levels completely quench the near band edge a
nd the conventional yellow emissions. We discuss the structural origin of t
hese defects in terms of formation of V-Ga-Si-Ga and V-Ga-O-N complexes. Th
e consequences of our model with respect to non radiative transitions at th
reading dislocations are also presented. An excitonic transition at 3.41 eV
close to the near band edge line on differently grown epitaxial GaN has be
en correlated to stacking faults. This line can be explained by a model bas
ed on the concept of excitons bound to SFs that form a quantum well of cubi
c material in the wurtzite lattice of the layer.