Phonon generation by current-carrying nanostructures

Citation
H. Totland et al., Phonon generation by current-carrying nanostructures, PHYS REV B, 59(4), 1999, pp. 2833-2840
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
59
Issue
4
Year of publication
1999
Pages
2833 - 2840
Database
ISI
SICI code
0163-1829(19990115)59:4<2833:PGBCN>2.0.ZU;2-Z
Abstract
We calculate the rate of acoustic phonon generation by a current-carrying, ballistic quantum channel, defined in a two-dimensional electron gas by a s plit gate. Both uniform and nonuniform channels are considered. The generat ion rate of acoustic phonons of a particular frequency and direction of pro pagation is a steplike function of the applied bias voltage, with threshold voltages that are calculated in the paper. The emitted phonons have a char acteristic angular distribution, which changes significantly at the thresho lds. The voltage dependence of the generation rate is shown to be sensitive to the shape of the channel. Thus, the spectral and spatial distributions of the emitted phonons bear information both on electron-phonon coupling in the vicinity of the device and on characteristics of the electron spectrum . [S0163-1829(99)02904-5].