Production of uniform plasma with surface electromagnetic wave launched bya waveguide-surfatron

Authors
Wu, CF Zhan, RJ Wu, S
Citation
Cf. Wu et al., Production of uniform plasma with surface electromagnetic wave launched bya waveguide-surfatron, REV SCI INS, 70(2), 1999, pp. 1522-1524
Citations number
6
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
REVIEW OF SCIENTIFIC INSTRUMENTS
ISSN journal
00346748 → ACNP
Volume
70
Issue
2
Year of publication
1999
Pages
1522 - 1524
Database
ISI
SICI code
0034-6748(199902)70:2<1522:POUPWS>2.0.ZU;2-5
Abstract
A uniform plasma of large volume is produced by using a new waveguide-surfa tron. The plasma is uniform within +/-5% in a diameter over 160 mm in the d iffusion area. The plasma density is 10(10)-10(11) cm(-3) with electron tem perature 2-4 eV at a microwave power of 500-900 W and a pressure of 10-50 P a. (C) 1999 American Institute of Physics. [S0034-6748(99)03802-2].