Fy. Chuang et al., ENHANCEMENT ON FIELD-EMISSION CHARACTERISTICS OF PULSED-LASER DEPOSITED DIAMOND-LIKE CARBON-FILMS USING AU PRECOATINGS, Applied physics letters, 70(16), 1997, pp. 2111-2113
Using Au precoatings has been observed to significantly enhance the fi
eld emission properties of diamondlike carbon (DLC) films deposited on
Si substrates. The electron emission can be turned on at a low field
as 7 V/mu m and a large emission current density as 2000 mu A/cm(2) ca
n be obtained at 20 V/mu m applied field. However, preannealing the Au
-coated Si substrates at 500 degrees C for 30 min is necessary to achi
eve such a performance. Microscopic examination on surface and cross-s
ectional morphologies of the DLC/Au/Si films using atomic force micros
copy and scanning electron microscopy, respectively, in conjunction wi
th the elemental depth profile examination of these films using second
ary ion mass spectroscopy, indicated that substantial interdiffusion b
etween DLC, Au, and Si layers has occurred. Such kind of reaction is p
roposed to lower the resistance for electrons to transport across the
interfaces and, thereafter, enhances the field emission properties of
the DLC/Au/Si films. (C) 1997 American Institute of Physics.