X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-DIFFRACTION STUDY OF THE THERMAL OXIDE ON GALLIUM NITRIDE

Citation
Sd. Wolter et al., X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-DIFFRACTION STUDY OF THE THERMAL OXIDE ON GALLIUM NITRIDE, Applied physics letters, 70(16), 1997, pp. 2156-2158
Citations number
24
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
70
Issue
16
Year of publication
1997
Pages
2156 - 2158
Database
ISI
SICI code
0003-6951(1997)70:16<2156:XPAXSO>2.0.ZU;2-C
Abstract
The oxidation of single crystal gallium nitride in dry air has been in vestigated. X-ray photoelectron spectroscopy (XPS) revealed minimal ox ide growth at 450 and 750 degrees C for up to 25 h. However, at 900 de grees C the growth of an oxide approximately 5000 Angstrom thick was o bserved after 25 h. This oxide was determined to be the monoclinic bet a-Ga2O3 using glancing angle x-ray diffraction. XPS spectra of the Ga 3d and Ga 2p core levels indicated peak shifts of 1.2 and 1.3 eV, resp ectively, from Ga-O to Ga-N bonding. The Ga L3M45M45 core level bindin g energy was also investigated and beta-Ga2O3 and GaN each presented a characteristic peak shape. (C) 1997 American Institute of Physics.