Sd. Wolter et al., X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-DIFFRACTION STUDY OF THE THERMAL OXIDE ON GALLIUM NITRIDE, Applied physics letters, 70(16), 1997, pp. 2156-2158
The oxidation of single crystal gallium nitride in dry air has been in
vestigated. X-ray photoelectron spectroscopy (XPS) revealed minimal ox
ide growth at 450 and 750 degrees C for up to 25 h. However, at 900 de
grees C the growth of an oxide approximately 5000 Angstrom thick was o
bserved after 25 h. This oxide was determined to be the monoclinic bet
a-Ga2O3 using glancing angle x-ray diffraction. XPS spectra of the Ga
3d and Ga 2p core levels indicated peak shifts of 1.2 and 1.3 eV, resp
ectively, from Ga-O to Ga-N bonding. The Ga L3M45M45 core level bindin
g energy was also investigated and beta-Ga2O3 and GaN each presented a
characteristic peak shape. (C) 1997 American Institute of Physics.