Multielement analysis of graphite and silicon carbide by inductively coupled plasma atomic emission spectrometry using solid sampling and electrothermal vaporization
U. Schaffer et V. Krivan, Multielement analysis of graphite and silicon carbide by inductively coupled plasma atomic emission spectrometry using solid sampling and electrothermal vaporization, ANALYT CHEM, 71(4), 1999, pp. 849-854
An improved graphite furnace electrothermal vaporization device, equipped w
ith an autosampler system for precise and almost contamination-free introdu
ction of solid samples, was used for the simultaneous determination of Al,
Ag, As, Bi, Ca, Co, Cr, Cu, Fe, Ga, K, Li, Mg, Na, Ni, and Pb in graphite a
nd silicon carbide by inductively coupled plasma atomic emission spectromet
ry, The volatilization of most analytes could be significantly improved by
addition of Freon 1,2 to the argon carrier gas. Calibration was performed u
sing aqueous standard solutions. Owing to the extremely low blanks, large a
pplicable sample portions (up to 16 mg), high transport efficiency, and the
addition of Freon 1,2, extraordinarily low limits of detection in the rang
e 5-250 ng/g were achieved. The accuracy was checked by comparison of the r
esults with those obtained by various other methods. For most analytes in b
oth matrixes, the comparison led to very good agreement of the results.