Multielement analysis of graphite and silicon carbide by inductively coupled plasma atomic emission spectrometry using solid sampling and electrothermal vaporization

Citation
U. Schaffer et V. Krivan, Multielement analysis of graphite and silicon carbide by inductively coupled plasma atomic emission spectrometry using solid sampling and electrothermal vaporization, ANALYT CHEM, 71(4), 1999, pp. 849-854
Citations number
36
Categorie Soggetti
Chemistry & Analysis","Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ANALYTICAL CHEMISTRY
ISSN journal
00032700 → ACNP
Volume
71
Issue
4
Year of publication
1999
Pages
849 - 854
Database
ISI
SICI code
0003-2700(19990215)71:4<849:MAOGAS>2.0.ZU;2-H
Abstract
An improved graphite furnace electrothermal vaporization device, equipped w ith an autosampler system for precise and almost contamination-free introdu ction of solid samples, was used for the simultaneous determination of Al, Ag, As, Bi, Ca, Co, Cr, Cu, Fe, Ga, K, Li, Mg, Na, Ni, and Pb in graphite a nd silicon carbide by inductively coupled plasma atomic emission spectromet ry, The volatilization of most analytes could be significantly improved by addition of Freon 1,2 to the argon carrier gas. Calibration was performed u sing aqueous standard solutions. Owing to the extremely low blanks, large a pplicable sample portions (up to 16 mg), high transport efficiency, and the addition of Freon 1,2, extraordinarily low limits of detection in the rang e 5-250 ng/g were achieved. The accuracy was checked by comparison of the r esults with those obtained by various other methods. For most analytes in b oth matrixes, the comparison led to very good agreement of the results.