UV laser polishing of thick diamond films for IR windows

Citation
S. Gloor et al., UV laser polishing of thick diamond films for IR windows, APPL SURF S, 139, 1999, pp. 135-139
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
139
Year of publication
1999
Pages
135 - 139
Database
ISI
SICI code
0169-4332(199901)139:<135:ULPOTD>2.0.ZU;2-Z
Abstract
Diamond has very suitable properties for infrared (IR) window applications. The rugged surface of a free-standing 320 mu m thick diamond film grown by chemical vapour deposition (CVD) is polished with the UV light of an ArF e xcimer laser (lambda = 193 nm). The angle of incidence is 85 degrees and ir radiation is subsequently performed at three planar directions around the p erpendicular axis. Scanning electron microscopy (SEM) is used to visualise the surface before and after the polishing procedure. With a profilometer ( tip radius 5 mu m) the improvement of the average roughness of the surface is measured. Polishing is analysed in dependence on the size of surface irr egularities by means of fast Fourier transformation (FFT) of the signal of the profilometer. Surface roughness measurements are also performed on the polished surface with an atomic force microscope (AFM). With LR transmittan ce measurements the optical quality is analysed over a wavelength range of 2.5 to 25 mu m before and after polishing. The oxidative removal of the las er induced graphitic layer is studied with optical spectroscopy techniques. (C) 1999 Elsevier Science B.V. All rights reserved.