On the role of ambient oxygen in the formation of lead titanate pulsed laser deposition thin films

Citation
N. Chaoui et al., On the role of ambient oxygen in the formation of lead titanate pulsed laser deposition thin films, APPL SURF S, 139, 1999, pp. 256-260
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
139
Year of publication
1999
Pages
256 - 260
Database
ISI
SICI code
0169-4332(199901)139:<256:OTROAO>2.0.ZU;2-U
Abstract
Static oxygen transfer mechanisms (i.e. oxidation during the cooling step a nd between laser pulses) of pulsed laser deposition (PLD) lead titanate thi n films have been studied by using O-18 tracing technique and d-SIMS profil ing. During the cooling, it has been shown that about 15% of total oxygen c ontent of the Film origin from ambient gas. The mechanism of oxygen transfe r has been attributed to surface oxygen exchange and vacancies diffusion me chanisms. On the other hand, a non negligible ambient oxygen transfer in th e film between laser pulses has been pointed out. (C) 1999 Elsevier Science B.V. All rights reserved.