P. Raynaud et al., Infrared absorption analysis of organosilicon/oxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance, APPL SURF S, 139, 1999, pp. 285-291
The dissociation of four groups of organosilicon monomers (hexamethyldisilo
xane, tetraethoxysilane, tetramethylsilane or tetramethoxysilane) in a mult
ipolar microwave plasma reactor is analyzed by infrared absorption spectros
copy (IRAS), The parent molecules are totally dissociated above 100 W. The
resulting stable molecules, such as C2H2, CH4, CO2, CO, C2H4, and OCH2 have
been detected at low power but are dissociated at higher power. Each group
exhibits its own characteristics of dissociation as well as production of
new species depending on its chemical composition. The LR measurements conf
irm the extreme effectiveness of the distributed electron cyclotron resonan
ce (DECR) plasma excitation mode in molecular dissociation. It seems that t
he DECR plasma at high energy dissociates the monomer molecule into its con
stituent atoms. (C) 1999 Elsevier Science B.V. All rights reserved.