Enhanced free carrier generation in boron nitride films by pulsed laser radiation

Citation
V. Ageev et al., Enhanced free carrier generation in boron nitride films by pulsed laser radiation, APPL SURF S, 139, 1999, pp. 364-369
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
139
Year of publication
1999
Pages
364 - 369
Database
ISI
SICI code
0169-4332(199901)139:<364:EFCGIB>2.0.ZU;2-2
Abstract
A transient laser photoconductivity (PC) technique is applied to the: inves tigation of non-linear multi-photon excitation of mixed cBN/hBN films. A se lection of sub-micron thickness films on sapphire substrates with different stoichiometries were synthesized using ion-assisted and ECR-plasma CVD tec hniques. Efficient free carrier generation in these thin films is demonstra ted under nanosecond pulses excitation from VIS/UV harmonics of a Nd:YAG la ser. The effect is shown to be influenced largely by the nitrogen deficienc y and the carbon impurities present in the BN thin films. Both parameters a re responsible for the existence of donor and acceptor levels in the materi al. A laser generated 400 mV electrical signal was realized when using 200 nm boron-rich hBN films. A method for further enhancing the carrier generat ion efficiency via post-growth X-ray irradiation of the films is demonstrat ed. (C) 1999 Elsevier Science B.V. All rights: reserved.