On the growth of LiF films by Pulsed Laser Deposition

The production of Lithium fluoride (LiF) films by Pulsed Laser Deposition i s reported for the first time. The influence of several deposition paramete rs such as the laser energy density, the presence of a gas pressure (10(-1) mbar of He) and the substrate temperature on the film quality is studied b y using in-situ reflectivity measurements, Scanning Electron Microscopy and X-ray diffraction. Films deposited in vacuum are polycrystalline and fully textured along the [100] orientation, whereas those grown in He pressure p resent a more complicated structure. Films are generally rough, the roughne ss decreasing as the substrate temperature increases or the laser energy de nsity decreases. The origin of this roughness is discussed in terms of the ablation mechanism taking place at the target. (C) 1999 Elsevier Science B. V. All rights reserved.