Results are presented on electroless metallization of carbon via the format
ion of carbon nitride films. The proposed process, takes advantage of the s
trong chemical affinity of palladium towards nitrogenated species to cause
the chemisorption of the catalyst (Pd) on the carbon nitride films. In the
present work, thin carbon nitride (CNx) films were deposited onto polycarbo
nate, glass or silicon substrates by DC magnetron sputtering of a graphite
target in a reactive atmosphere (pure nitrogen and nitrogen-argon mixture).
Deposition parameters of CNx films were optimised for the metallization it
self through photoelectron spectroscopy (XPS) and adhesion (fragmentation t
est) measurements. (C) 1999 Elsevier Science B.V. All rights reserved.