Analysis of thickness profiles of pulsed laser deposited metal films

Citation
Z. Kantor et al., Analysis of thickness profiles of pulsed laser deposited metal films, APPL SURF S, 139, 1999, pp. 599-604
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
139
Year of publication
1999
Pages
599 - 604
Database
ISI
SICI code
0169-4332(199901)139:<599:AOTPOP>2.0.ZU;2-J
Abstract
Practically all theoretical approaches to pulsed laser deposition start on a condition which is extremely hard to realize in practice: that the target surface is smooth and plane. When using liquid (molten) targets, the probl em of surface deterioration upon repetitive ablation can completely be solv ed, allowing for fair comparison of experiment and theory. In this paper me asured thickness profiles of metal films deposited in vacuum from molten In , Sn, Bi and Sn-Bi alloy targets are compared with calculated distribution functions. The strictly symmetrical thickness profiles of tin and indium fi lms, derived from two-dimensional optical density maps and Rutherford backs cattering data are analysed in terms of Lorentzian-like functions, originat ing from the so-called shifted Maxwellian velocity distribution. The bismut h profiles show a characteristic deviation from this shape. (C) 1999 Elsevi er Science B.V. All rights reserved.