Fabrication of a silicon micro-probe for vertical probe card application

Citation
Yd. Kim et al., Fabrication of a silicon micro-probe for vertical probe card application, JPN J A P 1, 37(12B), 1998, pp. 7070-7073
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
37
Issue
12B
Year of publication
1998
Pages
7070 - 7073
Database
ISI
SICI code
Abstract
We report on the fabrication of a new type of probe card that uses a porous silicon micromachining technique. Curled cantilever tips are fabricated us ing surface tension and the difference in the thermal expansion coefficient between the films. The contact resistance of cantilever tips with an alumi num pad is basically below 1 Ohm and there is no change of contact resistan ce after 700,000 contacts.