Characterization of CdTe substrates and MOCVD Cd1-xZnxTe epilayers

Citation
M. Levy et al., Characterization of CdTe substrates and MOCVD Cd1-xZnxTe epilayers, J CRYST GR, 197(3), 1999, pp. 626-629
Citations number
8
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
197
Issue
3
Year of publication
1999
Pages
626 - 629
Database
ISI
SICI code
0022-0248(199902)197:3<626:COCSAM>2.0.ZU;2-X
Abstract
The quality of CdTe substrates and of Cd1-xZnxTe (x less than or equal to 0 .1) epilayers grown by metalorganic chemical vapor deposition (MOCVD) on Cd Te substrates, were characterized by Raman scattering, by photoluminescence (PL) as well as by X-ray double crystal rocking curve (DCRC). At low tempe rature the Raman intensity of the LO phonon was enhanced wherever there was a structural defect. The quantitative measure of the structural perfection is related to the ratio between the defect band and excitonic peaks, and c orrelates with the X-ray full-width at half-maximum (FWHM) of the layer pea k. It is shown that in addition to these parameters, the FWHM of the PL def ect band is a useful parameter to determine the quality of the epilayer, an d a good correlation is obtained between the different parameters. The effe ct of zinc partial pressure during growth and the reactor design are studie d. The results indicate that crystalline imperfection is caused by lattice mismatch between the CdTe substrate and the CdZnTe epilayer and by the nonu niformity of the zinc composition throughout the layers. (C) 1999 Elsevier Science B.V. All rights reserved.