Synthesis of silicon-based polymerized films by excimer laser ablation deposition of hexaphenyldisilane

Authors
Zeng, XY Rossignol, F Konno, S Nagai, H Nakata, Y Okutani, T Suzuki, M
Citation
Xy. Zeng et al., Synthesis of silicon-based polymerized films by excimer laser ablation deposition of hexaphenyldisilane, J MATER RES, 14(1), 1999, pp. 232-245
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
14
Issue
1
Year of publication
1999
Pages
232 - 245
Database
ISI
SICI code
0884-2914(199901)14:1<232:SOSPFB>2.0.ZU;2-U
Abstract
A new method of synthesizing silicon-based polymer films by excimer laser a blation of hexaphenyldisilane (HPDS) has been studied. The polymerized film s were formed on a substrate by laser ablation deposition of HPDS at 248 nm . The structure of the polymerized films depended strongly on the laser flu ence and repetition rates. The thermal stability and hardness of the deposi ted films were estimated by thermogravimetry and a Vickers microhardness me ter. The films showed good thermal stability, depending on the laser proces sing parameters.