Interface charge and nonradiative carrier recombination in Ga2O3-GaAs interface structures

Citation
M. Passlack et al., Interface charge and nonradiative carrier recombination in Ga2O3-GaAs interface structures, J VAC SCI B, 17(1), 1999, pp. 49-52
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
1
Year of publication
1999
Pages
49 - 52
Database
ISI
SICI code
1071-1023(199901/02)17:1<49:ICANCR>2.0.ZU;2-X
Abstract
We have investigated the dual role of interfacial defects in creating both nonradiative interface recombination and interface charge. Our studies are based on Ga2O3-GaAs interface structures with their unique properties such as low interface state density and radiative GaAs band-to-band recombinatio n. The self-consistent analysis of the steady-state dependence of the spont aneous GaAs emission on excitation density provides all critical characteri stics of interfacial defects simultaneously: the density of interface state s, their capture cross sections, the interface recombination velocities, an d the oxide charge. (C) 1999 American Vacuum Society. [S0734-211X(99)02401- 4].