M. Maeda et al., Dielectric characteristics of a metal-insulator-metal capacitor using plasma-enhanced chemical vapor deposited silicon nitride films, J VAC SCI B, 17(1), 1999, pp. 201-204
Dielectric characteristics of a metal-insulator-metal (MIM) capacitor using
plasma-enhanced chemical vapor deposited thin silicon nitride films have b
een evaluated. The capacitance values of the MIM capacitors are in proporti
on to the area of capacitors and in inverse proportion to the thickness of
silicon nitride films. The breakdown strength of silicon nitride films with
thicknesses of less than 0.2 mu m decreases because of the concentration o
f electrical fields at hillocks induced on the aluminum surface. However, a
bout 3 MV/cm is obtained in the silicon nitride films with thicknesses of 0
.1 mu m. The dielectric losses of the MIM capacitors are low enough up to t
he gigahertz regions. (C) 1999 American Vacuum Society. [S0734-211X(99)0180
1-6].