Real-time observation of aluminum chemical vapor deposition in an environmental scanning electron microscope

A technique has been developed Co provide real-time imaging, with several n anometer resolution, of organometallic chemical vapor deposition (CVD) by s canning electron microscopy under conditions approaching those used in the microelectronics industry. The technique involves modifications to an envir onmental scanning electron microscope (ESEM) to facilitate organometallic p recursor gas handling and sample heating. To demonstrate the usefulness of this technique for studying the microstructural evolution of CVD-grown meta l mms, results of Al/SiO2 CVD experiments are presented.