Pulsed bias pulsed RF characterization measurement system of FET at constant intrinsic voltages

Citation
C. Gaquiere et al., Pulsed bias pulsed RF characterization measurement system of FET at constant intrinsic voltages, MICROW OPT, 20(5), 1999, pp. 349-352
Citations number
7
Categorie Soggetti
Optics & Acoustics
Journal title
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS
ISSN journal
08952477 → ACNP
Volume
20
Issue
5
Year of publication
1999
Pages
349 - 352
Database
ISI
SICI code
0895-2477(19990305)20:5<349:PBPRCM>2.0.ZU;2-L
Abstract
For the first time to our knowledge, a pulsed measurement system has been d eveloped which supports the simultaneous measurement of pulsed I-ds(V-ds, V -gs) and pulsed scattering parameters of FETs at constant intrinsic voltage s. This tool is very useful for the development of nonlinear electrical mod els of microwave active devices, Indeed the nonlinear electrical models pre defined in the commercial software impose on the user the need to determine the behavior of the actine devices at constant intrinsic voltages. (C) 199 9 John Wiley & Sons, Inc.