Ff. Komarov et al., Influence of initial charge and charge state fluctuations on high-energy ion ranges and track formation, NUCL INST B, 148(1-4), 1999, pp. 159-163
A model used for calculating the depth distribution of implanted atoms and
the energy deposited into the electron and nuclear subsystems of solids is
studied. The model is based on the transport equations and takes into accou
nt the initial charge and the fluctuations of charge states of high-energy
ions (E > 1 MeV/amu). The critical dose of 250 MeV Xe+ ions necessary for t
he formation of deep amorphous layers in Si, GaAs and InP have been estimat
ed. The process of the formation of continuous track regions in InP by 250
MeV Xe+ ions is studied. (C) 1999 Elsevier Science B.V. All rights reserved
.