Deposition of magnetic thin films by IBAD

Citation
T. Sikola et al., Deposition of magnetic thin films by IBAD, NUCL INST B, 148(1-4), 1999, pp. 907-911
Citations number
8
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
148
Issue
1-4
Year of publication
1999
Pages
907 - 911
Database
ISI
SICI code
0168-583X(199901)148:1-4<907:DOMTFB>2.0.ZU;2-N
Abstract
Cobalt and nickel magnetic films were prepared by ion-beam assisted deposit ion method (IBAD), The main goal of the work was to study the influence of the assisting low-energy-argon-ion beam and substrate temperature on the ch aracteristics and properties of the films. in particular on thickness, roug hness, chemical composition, structure and magnetic properties of thin film s. The experiments revealed that the assisting argon ions influence most re markably an in-plane magnetic anisotropy of the films, On the other hand, e nhanced substrate temperatures suppress the anisotropy of the films. Influe nce of these two deposition parameters on roughness, composition and struct ure of thin films was not dramatic. (C) 1999 Elsevier Science B.V. All righ ts reserved.