LEEM measurements of step energies at the (001) surface of heavily boron-doped silicon

Citation
Jb. Hannon et al., LEEM measurements of step energies at the (001) surface of heavily boron-doped silicon, SURF REV L, 5(6), 1998, pp. 1159-1165
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SURFACE REVIEW AND LETTERS
ISSN journal
0218625X → ACNP
Volume
5
Issue
6
Year of publication
1998
Pages
1159 - 1165
Database
ISI
SICI code
0218-625X(199812)5:6<1159:LMOSEA>2.0.ZU;2-1
Abstract
We have used the low energy electron microscope (LEEM) to investigate step faceting and striped phase formation on heavily boron-doped Si(001) surface s. Measurements of thermal fluctuations along the steps, equilibrium island shapes, and the angle of triangular facets provide quantitative informatio n on the step formation energies. We find that a simple, systematic tempera ture dependence of the spatial anisotropy of the free energy of isolated st eps is sufficient to account for the observed faceting of the B type steps. These results suggest that the proliferation of straight A step edges at l ower temperature is caused by the energy of isolated A steps becoming vanis hingly small. We show that rapid cooling of the samples leads to the nuclea tion and growth of a high density of vacancy islands on the surfaces. Based on these results, we propose a qualitative model for mass transport during stripe formation.