A new UHV spectroscopic X-ray photoelectron emission and low energy electro
n microscope is presently under construction for the installation at the PM
-6 soft X-ray undulator beamline at BESSY II. Using a combination of a soph
isticated magnetic beam splitter and an electrostatic tetrode mirror, the s
pherical and chromatic aberrations of the objective lens are corrected and
thus the lateral resolution and sensitivity of the instrument improved. In
addition a corrected imaging energy filter (a so-called omega filter) allow
s high spectral resolution (Delta E = 0.1 eV) in the photoemission modes an
d background suppression in LEEM and small-spot LEED modes. The theoretical
prediction for the lateral resolution is 5 Angstrom; a realistic goal is a
bout 2 nm. Thus, a variety of electron spectroscopies (XAS, XPS, UPS, XAES)
and electron diffraction (LEED, LEEM) or reflection techniques (MEM) will
be available with spatial resolution unreached so far.