Layers of silver chloride were formed by exposing the Ag(100) surface to ga
seous chlorine at 250 K. The growth and structure of the AgCl layers have b
een characterized by XPD, LEIS and LEED. The formation of AgCl was monitore
d by looking at the line shape and position of the Ag M-4,M-5 VV transition
s. The chlorination process was also followed by LEIS. The XPD data, collec
ted keeping the sample at 150 K, indicate that AgCl layers ca. 20 Angstrom
thick grow with the (111) plane parallel to the substrate surface but rando
mly oriented with respect to the Ag(100) surface. Instead, the XPD patterns
show that thicker AgCl films grow epitaxially on Ag(100). (C) 1999 Elsevie
r Science B.V. All rights reserved.