Epitaxial growth of AgCl layers on the Ag(100) surface

Citation
Bv. Andryushechkin et al., Epitaxial growth of AgCl layers on the Ag(100) surface, SURF SCI, 421(1-2), 1999, pp. 27-32
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
421
Issue
1-2
Year of publication
1999
Pages
27 - 32
Database
ISI
SICI code
0039-6028(19990204)421:1-2<27:EGOALO>2.0.ZU;2-3
Abstract
Layers of silver chloride were formed by exposing the Ag(100) surface to ga seous chlorine at 250 K. The growth and structure of the AgCl layers have b een characterized by XPD, LEIS and LEED. The formation of AgCl was monitore d by looking at the line shape and position of the Ag M-4,M-5 VV transition s. The chlorination process was also followed by LEIS. The XPD data, collec ted keeping the sample at 150 K, indicate that AgCl layers ca. 20 Angstrom thick grow with the (111) plane parallel to the substrate surface but rando mly oriented with respect to the Ag(100) surface. Instead, the XPD patterns show that thicker AgCl films grow epitaxially on Ag(100). (C) 1999 Elsevie r Science B.V. All rights reserved.