ULTRAVIOLET-LIGHT IMPRINTED SOL-GEL SILICA GLASS LOW-LOSS WAVE-GUIDESFOR USE AT 1.55 MU-M

The fabrication and characterization of UV-light-imprinted sol-gel sil ica glass waveguides on glass and silicon substrates are described. Wa veguide fabrication parameters are evaluated. Appropriate combinations of UV light exposure time, sol-gel film thickness, and postbake time produce waveguides suitable for use at a 1.55-mu m wavelength. Propaga tion losses in these waveguides are less than 0.3 dB/cm. (C) 1997 Soci ety of Photo-Optical Instrumentation Engineers.