Self-supporting carbon thin films used in the heavy-ion beam

Citation
W. Thalheimer et al., Self-supporting carbon thin films used in the heavy-ion beam, CRYST RES T, 34(2), 1999, pp. 175-179
Citations number
8
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CRYSTAL RESEARCH AND TECHNOLOGY
ISSN journal
02321300 → ACNP
Volume
34
Issue
2
Year of publication
1999
Pages
175 - 179
Database
ISI
SICI code
0232-1300(1999)34:2<175:SCTFUI>2.0.ZU;2-C
Abstract
Self-supporting carbon thin films are needed for the heavy-ion beam at the Gesellschaft fur Schwerionenforschung (GSI) as targets, as stripper foils, and as carrying substrates. The thin films are produced through resistance evaporation under high vacuum. Carbon is deposited on a glass plate that is covered with an organic material that is soluble in water. Through dissolv ing the interlayer a self-supporting carbon film is obtained, which is fetc hed on an aluminium frame. Thin films of 5 mu g/cm(2) up to 100 mu g/cm(2), an be produced with this method. The production process as well as the chan ging of the layer structure through the energy deposit is going to be discu ssed.