authors describe a novel technique for the nondestructive evaluation of mic
roelectronic components using Xray microtomography. Existing microtomograph
y systems have spatial resolution of order 1 mu m but require X-ray source
brilliance that would become unachievable at higher resolutions. The author
s describe an imaging method that reduces the number of X-ray photons requi
red from the source without degrading the resolution. The feasibility of th
e technique is demonstrated through a series of computer simulations. The r
esults are verified with real data from synchrotron experiments.