Spatial and temperature dependence of carrier recombination in an InGaAs/InP heterostructure

Citation
Afg. Monte et al., Spatial and temperature dependence of carrier recombination in an InGaAs/InP heterostructure, J APPL PHYS, 85(5), 1999, pp. 2866-2869
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
5
Year of publication
1999
Pages
2866 - 2869
Database
ISI
SICI code
0021-8979(19990301)85:5<2866:SATDOC>2.0.ZU;2-6
Abstract
The microluminescence surface scan technique has been used to investigate a mbipolar carrier diffusion, photon diffusion, and photocarrier recombinatio n in a nominally undoped InGaAs bulk layer lattice matched to InP grown by vapor levitation epitaxy. Measurements taken at different temperatures betw een 75 and 300 K are discussed in terms of the relative contribution of the two distinct mechanisms to the spectrally integrated luminescence intensit y, namely, photon diffusion and photocarrier diffusion. (C) 1999 American I nstitute of Physics. [S0021-8979(99)06304-5].