Measurement of stress distribution in Si3N4 using AlN thin films

Authors
Akiyama, M Xu, CN Nonaka, K Watanabe, T Usui, I
Citation
M. Akiyama et al., Measurement of stress distribution in Si3N4 using AlN thin films, J MAT SCI L, 17(24), 1998, pp. 2093-2095
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
17
Issue
24
Year of publication
1998
Pages
2093 - 2095
Database
ISI
SICI code
0261-8028(199812)17:24<2093:MOSDIS>2.0.ZU;2-Q