CuInSe2 (CIS) films were prepared by the stacked elemental layer (SEL) tech
nique with subsequent post deposition rapid thermal processing. This techni
que offered uniform deposition over a considerably large area (similar to 4
cm(2)) with perfect control on the individual elemental fluxes. In this me
thod, elemental layers of Cu, In and Se were sequentially deposited on soda
-lime glass substrates at room temperature (300 K) in appropriate thickness
ratios to ensure the desired composition in the film. The layers were anne
aled by the rapid thermal process in a temperature range of 373-723 K with
an interval of 100 K and at a high ramp rate (similar to 30 K s(-1)) using
tungsten lamps to ascertain the optimum annealing condition. Structural inv
estigations were carried out by the XRD measurements in order to optimize t
he annealing parameters (e.g., ramp rate and annealing temperature) for obt
aining high quality CIS films free from the deleterious secondary binary ph
ases. It was found that high quality films could be obtained by annealing t
he stack at 673 K for 3 min in argon atmosphere. (C) 1999 Elsevier Science
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