The influence of prefiring conditions on the epitaxy of Pb(Zr,Ti)O-3 filmsby dipping-pyrolysis process

Authors
Citation
Ks. Hwang, The influence of prefiring conditions on the epitaxy of Pb(Zr,Ti)O-3 filmsby dipping-pyrolysis process, MATER CH PH, 57(3), 1999, pp. 228-231
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS CHEMISTRY AND PHYSICS
ISSN journal
02540584 → ACNP
Volume
57
Issue
3
Year of publication
1999
Pages
228 - 231
Database
ISI
SICI code
0254-0584(19990125)57:3<228:TIOPCO>2.0.ZU;2-P
Abstract
Pb(Zr,Ti)O-3 (PZT, Pb : Zr : Ti = 1 : 0.52 : 0.48) thin films were prepared by dipping-pyrolysis process using a mixed solution of lead-, zirconium- a nd titanium-naphthenates. The solution was spin-coated onto MgO(100) substr ates and the precursor films were prefired at 200 degrees C; in air or in a rgon for various holding times, followed by final heat treatment at 750 deg rees C. Highly oriented (00l)/(h00) PZT films with smooth, crack-free surfa ces were obtained for all the samples except the films prefired in air for 12 and 24 h. Pyrolysis at a low temperature (200 degrees C) in a non-oxidiz ing atmosphere (argon) was found to be most important for the epitaxy of pr oduct films. (C) 1999 Elsevier Science S.A. All rights reserved.