Far UV resonant Raman scattering in hexagonal Ga1-xAlxN alloys

Citation
F. Demangeot et al., Far UV resonant Raman scattering in hexagonal Ga1-xAlxN alloys, SOL ST COMM, 109(8), 1999, pp. 519-523
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
109
Issue
8
Year of publication
1999
Pages
519 - 523
Database
ISI
SICI code
0038-1098(1999)109:8<519:FURRSI>2.0.ZU;2-8
Abstract
UV excited (244 nm) Raman spectra of Ga1-xAlxN layers (0 < x less than or e qual to 0.85) grown on sapphire substrates by metal-organic vapor phase epi taxy have been acquired. In contrast with photoluminescence governed by dee p center recombinations in aluminum-rich layers (x > 0.55), strong multiple A(1)(LO)-phonon scattering mediated by Frohlich electron-phonon interactio n gives evidence for electronic excitations across the band gap as intermed iate states of the Raman process over the whole compositional range. Alloyi ng and temperature effects are used to obtain the resonant profile of the A (1)(LO) line intensity. The shift in line position, within spectra recorded under visible and ultraviolet excitation, is attributed to the probing of local compositional fluctuations by the long-range Frohlich interaction. (C ) 1999 Elsevier Science Ltd. All rights reserved.