An electronic transport was observed in honeycomb-shaped mesoscopic (submic
ron) networks at liquid helium temperature. These networks were manufacture
d by the reactive ion etching of highly (nearly degenerated) and moderately
doped n-GaAs epilayers through the initially structured, by self-organised
patterning, polymer masks. The free electron transport was observed in the
networks of thin, highly doped, n-GaAs epilayer. The detected multiple swi
tching on the I-V characteristics was explained in the framework of the mod
el of a dynamic random resistor network. The existence of the patterned par
t of the thick, moderately doped, n-GaAs epilayer was the reason for the in
crease of the compensation ratio, the ionization energy and, as a result, t
he threshold voltage of the impact ionization of the shallow donor impurity
level in the bulk of the epilayer. (C) 1999 Academic Press.