Effect of annealing conditions on the leakage current characteristics of ferroelectric PZT thin films grown by sol-gel process

Authors
Citation
Sm. Cho et Dy. Jeon, Effect of annealing conditions on the leakage current characteristics of ferroelectric PZT thin films grown by sol-gel process, THIN SOL FI, 338(1-2), 1999, pp. 149-154
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
338
Issue
1-2
Year of publication
1999
Pages
149 - 154
Database
ISI
SICI code
0040-6090(19990129)338:1-2<149:EOACOT>2.0.ZU;2-O
Abstract
The microstructure and leakage current of lead zirconate titanate (PZT) thi n films were investigated to understand the mechanism of the leakage curren t and also to attempt to improve the leakage characteristics. The PZT thin films were prepared using a sol-gel process followed by crystallization in three different gas ambients, i.e. N-2, air and O-2 The three kinds of crys tallized samples show different microstructure and orientation. Electrical characterization of the PZT thin films including the permittivity, P-E hyst eresis, and the leakage current was carried out. It was found that the leak age current was affected not only by the microstructures of the films but a lso by the interface between the Pt electrode and the PZT film. Moreover, i t was found that more than one conduction mechanism is involved in the rang e of electric field used in the experiment. In the low electric field regio n the current conduction is ohmic and its mechanism is found to be electron hopping among electron traps. In the high field region the sample treated in N-2 shows Schottky emission, the sample treated in O-2 shows space charg e limited conduction, and the sample treated in air shows both Schottky and space charge conduction together. (C) 1999 Elsevier Science S.A. All right s reserved.