High voltage (450 V) GaN schottky rectifiers

Citation
Zz. Bandic et al., High voltage (450 V) GaN schottky rectifiers, APPL PHYS L, 74(9), 1999, pp. 1266-1268
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
9
Year of publication
1999
Pages
1266 - 1268
Database
ISI
SICI code
0003-6951(19990301)74:9<1266:HV(VGS>2.0.ZU;2-Y
Abstract
We fabricated high standoff voltage (450 V) Schottky rectifiers on hydride vapor phase epitaxy grown GaN on sapphire substrate. Several Schottky devic e geometries were investigated, including lateral geometry with rectangular and circular contacts, mesa devices, and Schottky metal field plate overla pping a SiO2 layer. The best devices were characterized by an ON-state volt age of 4.2 V at a current density of 100 A/cm(2) and a saturation current d ensity of 10(-5) A/cm(2) at a reverse bias of 100 V. From the measured brea kdown voltage we estimated the critical field for electric breakdown in GaN to be (2.2+/-0.7) X 10(6) V/cm. This value for the critical field is a low er limit since most of the devices exhibited abrupt and premature breakdown associated with corner and edge effects. (C) 1999 American Institute of Ph ysics. [S0003-6951(99)02409-2].