Pm. Moran et Ff. Lange, Microscale lithography via channel stamping: Relationships between capillarity, channel filling, and debonding, APPL PHYS L, 74(9), 1999, pp. 1332-1334
A polymer or metallo-organic precursor solution may be transferred from the
channels of a stamp to a substrate producing a micron or submicron scale p
attern. The stamped polymer pattern is used as a mask for device fabricatio
n. The stamped metallo-organic precursor solution is heat treated to produc
e a metal or ceramic pattern directly. Here we report conditions that optim
ize the filling of channels, the debonding of the solution from the channel
s during evaporation, and the transfer of the pattern to a substrate. We sh
ow that poor wetting can optimize these conditions. (C) 1999 American Insti
tute of Physics. [S0003-6951(99)02309-8].