Im. Anteney et al., Characterization of the effectiveness of carbon incorporation in SiGe for the elimination of parasitic energy barriers in SiGe HBT's, IEEE ELEC D, 20(3), 1999, pp. 116-118
An electrical method is applied to SiGe and SiGe:C heterojunction bipolar t
ransistors (HBT's) to extract the bandgap narrowing in the base layer and t
o characterize the presence of parasitic energy barriers in the conduction
band, arising from boron transient enhanced out-diffusion from the SiGe lay
er. It is shown that a background carbon concentration within the base (app
roximate to 10(20) cm(-3)) eliminates parasitic energy barriers at the coll
ector/base junction, and hence shows that transient enhanced diffusion of b
oron from the base has been completely suppressed.