Metamorphic In0.4Al0.6As/In0.4Ga0.6As HEMT's on GaAs substrate

Citation
S. Bollaert et al., Metamorphic In0.4Al0.6As/In0.4Ga0.6As HEMT's on GaAs substrate, IEEE ELEC D, 20(3), 1999, pp. 123-125
Citations number
5
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
20
Issue
3
Year of publication
1999
Pages
123 - 125
Database
ISI
SICI code
0741-3106(199903)20:3<123:MIHOGS>2.0.ZU;2-Y
Abstract
New In0.4Al0.6As/In0.4Ga0.6As metamorphic (MM) high electron mobility trans istors (HEMT's) have been successfully fabricated on GaAs substrate with T- shaped gate lengths varying from 0.1 to 0.25 mu m. The Schottky characteris tics are a forward turn-on voltage of 0.7 V and a gate breakdown voltage of -10.5 V, These new MM-HEMT's exhibit typical drain currents of 600 mA/mm a nd extrinsic transconductance superior to 720 mS/mm, An extrinsic current c utoff frequency f(T) of 195 GHz is achieved with the 0.1-mu m gate length d evice. These results are the first reported for In0.4Al0.6As/In0.4Ga0.6As M M-HEMT's on GaAs substrate.