Performance and reliability comparison between asymmetric and symmetric LDD devices and logic gates

Citation
Jf. Chen et al., Performance and reliability comparison between asymmetric and symmetric LDD devices and logic gates, IEEE J SOLI, 34(3), 1999, pp. 367-371
Citations number
14
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF SOLID-STATE CIRCUITS
ISSN journal
00189200 → ACNP
Volume
34
Issue
3
Year of publication
1999
Pages
367 - 371
Database
ISI
SICI code
0018-9200(199903)34:3<367:PARCBA>2.0.ZU;2-V
Abstract
The performance and reliability of NMOSFET asymmetric lightly doped drain ( LDD) devices (with no LDD on the source side) are compared with those of co nventional LDD devices. At a fixed V-dd, asymmetric LDD devices exhibit hig her I-dsat and shorter hot-carrier lifetime. To maintain the same hot-carri er lifetime, asymmetric LDD devices must operate at lower V-dd while higher I-dsat is retained. For the same hot-carrier lifetime, ring oscillators wi th NMOSFET asymmetric LDD devices can achieve 5% (10% if PMOSFET also had a symmetric LDD) higher speed and 10% lower power, The hot-carrier reliabilit y of inverter, NAND, and NOR structures with asymmetric and conventional LD D devices is also simulated and compared.